Diener plasma reactor (13,56 MHz)
Device description:
The device is designed for surface treatment of materials in plasma. It operates using low-temperature and low-pressure plasma generated at a frequency of 13.56 MHz. Due to its higher plasma density, it can be used for chemical surface modification and etching.
Features:
- radio frequency generator (HF): 13,56 MHz
- maximum power: 100 W
- reaction chamber volume: 500 cm3
- capability for two process gases max. flow rate: 90 cm3/min
- processing pressure: 0,01 – 1 mbar
Location:
Department of Physics and Materials Engineering (lab U15/404).
Responsible person:
Name: Aleš Mráček
Phone.: +420 576 035 102
Mobile: +420 733 690 668
Email: mracek@utb.cz
Office: U15/438