Diener plasma reactor (40 kHz)
Device description:
The device is designed for surface treatment of materials in plasma. It operates using low-temperature and low-pressure plasma generated at a frequency of 40 kHz. The device is equipped with a chamber featuring a rotational mechanism, enabling homogeneous surface treatment of powder materials or polymer granules. It is primarily intended for cleaning and activation of materials.
Features:
- radio frequency generator (LF): 40 kHz
- maximum power: 100 W
- reaction chamber volume: 500 cm3
- capability for two process gases max. flow rate: 90 cm3/min
- processing pressure: 0,01 – 1 mbar
Location:
Department of Physics and Materials Engineering (lab U15/404)
Responsible person:
Name: Aleš Mráček
Phone.: +420 576 035 102
Mobile: +420 733 690 668
Email: mracek@utb.cz
Office: U15/438